Iacopo Mochi
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Modal wavefront reconstruction from its gradient
I Mochi, KA Goldberg
Applied Optics 54 (12), 3780-3785, 2015
Fluorescence lidar imaging of the cathedral and baptistery of Parma
D Lognoli, G Cecchi, I Mochi, L Pantani, V Raimondi, R Chiari, ...
Applied Physics B 76, 457-465, 2003
Printability of native blank defects and programmed defects and their stack structures
HJ Kwon, J Harris-Jones, R Teki, A Cordes, T Nakajima, I Mochi, ...
Photomask Technology 2011 8166, 60-69, 2011
Commissioning an EUV mask microscope for lithography generations reaching 8 nm
KA Goldberg, I Mochi, M Benk, AP Allezy, MR Dickinson, CW Cork, ...
Extreme Ultraviolet (EUV) Lithography IV 8679, 347-356, 2013
The GIANO spectrometer: towards its first light at the TNG
E Oliva, L Origlia, R Maiolino, C Baffa, V Biliotti, P Bruno, G Falcini, ...
Ground-based and Airborne Instrumentation for Astronomy IV 8446, 1307-1315, 2012
Actinic imaging of native and programmed defects on a full-field mask
I Mochi
The GIANO-TNG spectrometer
E Oliva, L Origlia, C Baffa, C Biliotti, P Bruno, F D'Amato, C Del Vecchio, ...
Ground-based and Airborne Instrumentation for Astronomy 6269, 431-440, 2006
RESCAN: an actinic lensless microscope for defect inspection of EUV reticles
I Mochi, P Helfenstein, I Mohacsi, R Rajeev, D Kazazis, S Yoshitake, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041003-041003, 2017
Actinic extreme ultraviolet mask inspection beyond
KA Goldberg, P Naulleau, I Mochi, EH Anderson, SB Rekawa, CD Kemp, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research
KA Goldberg, I Mochi
Journal of Vacuum Science & Technology B 28 (6), C6E1-C6E10, 2010
GIANO-TNG spectroscopy of red supergiants in the young star cluster RSGC2
L Origlia, E Oliva, R Maiolino, A Mucciarelli, C Baffa, V Biliotti, P Bruno, ...
Astronomy & Astrophysics 560, A46, 2013
Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks
F Brizuela, S Carbajo, A Sakdinawat, D Alessi, DH Martz, Y Wang, ...
Optics Express 18 (14), 14467-14473, 2010
Progress in EUV resists towards high-NA EUV lithography
X Wang, Z Tasdemir, I Mochi, M Vockenhuber, L van Lent-Protasova, ...
Extreme Ultraviolet (EUV) Lithography X 10957, 19-27, 2019
Towards X-ray transient grating spectroscopy
C Svetina, R Mankowsky, G Knopp, F Koch, G Seniutinas, B Rösner, ...
Optics letters 44 (3), 574-577, 2019
Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging
P Helfenstein, R Rajeev, I Mochi, A Kleibert, CAF Vaz, Y Ekinci
Optics Express 26 (9), 12242-12256, 2018
Assist features: placement, impact, and relevance for EUV imaging
I Mochi, V Philipsen, E Gallagher, E Hendrickx, K Lyakhova, F Wittebrood, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 513-529, 2016
Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
R Fallica, D Kazazis, R Kirchner, A Voigt, I Mochi, H Schift, Y Ekinci
Journal of Vacuum Science & Technology B 35 (6), 2017
An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm
KA Goldberg, I Mochi, SB Rekawa, NS Smith, JB Macdougall, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 331-342, 2011
Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness
SA George, PP Naulleau, EM Gullikson, I Mochi, F Salmassi, KA Goldberg, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 137-146, 2011
A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection
S Huh, L Ren, D Chan, S Wurm, K Goldberg, I Mochi, T Nakajima, ...
Extreme ultraviolet (EUV) lithography 7636, 182-188, 2010
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