Double-heterojunction nanorod light-responsive LEDs for display applications N Oh, BH Kim, SY Cho, S Nam, SP Rogers, Y Jiang, JC Flanagan, Y Zhai, ... Science 355 (6325), 616-619, 2017 | 257 | 2017 |
Organosilane high polymers: Electronic spectra and photodegradation P Trefonas III, R West, RD Miller, D Hofer Journal of Polymer Science: Polymer Letters Edition 21 (10), 823-829, 1983 | 240* | 1983 |
Organosilane high polymers: thermochromic behavior in solution P Trefonas III, JR Damewood Jr, R West, RD Miller Organometallics 4 (7), 1318-1319, 1985 | 224 | 1985 |
Shot noise, LER, and quantum efficiency of EUV photoresists RL Brainard, P Trefonas, JH Lammers, CA Cutler, JF Mackevich, ... Emerging Lithographic Technologies VIII 5374, 74-85, 2004 | 220 | 2004 |
Polysilane high polymers: mechanism of photodegradation P Trefonas, R West, RD Miller Journal of the American Chemical Society 107 (9), 2737-2742, 1985 | 194 | 1985 |
The optical and electrical properties of silver nanowire mesh films G Khanarian, J Joo, XQ Liu, P Eastman, D Werner, K O'Connell, ... Journal of Applied Physics 114 (2), 2013 | 179 | 2013 |
Multilayer transfer printing for pixelated, multicolor quantum dot light-emitting diodes BH Kim, S Nam, N Oh, SY Cho, KJ Yu, CH Lee, J Zhang, K Deshpande, ... ACS nano 10 (5), 4920-4925, 2016 | 154 | 2016 |
Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent preassembled high-resolution and high-sensitivity negative-tone photoresist materials G Sun, S Cho, C Clark, SV Verkhoturov, MJ Eller, A Li, A Pavía-Jiménez, ... Journal of the American Chemical Society 135 (11), 4203-4206, 2013 | 136 | 2013 |
Organosilane high polymers: Synthesis of formable homopolymers P Trefonas III, PI Djurovich, XH Zhang, R West, RD Miller, D Hofer Journal of Polymer Science: Polymer Letters Edition 21 (10), 819-822, 1983 | 133 | 1983 |
New principle for image enhancement in single layer positive photoresists P Trefonas III, BK Daniels Advances in Resist Technology and Processing IV 771, 194-210, 1987 | 105* | 1987 |
Double-heterojunction nanorods MS Nuri Oh, Sooji Nam, You Zhai, Kishori Deshpande, Pete Trefonas Nature Communications 5, 3642, 2014 | 103 | 2014 |
Organogermane homopolymers and copolymers with organosilane P Trefonas, R West Journal of Polymer Science: Polymer Chemistry Edition 23 (8), 2099-2107, 1985 | 101 | 1985 |
Resist effects at small pitches D Van Steenwinckel, JH Lammers, T Koehler, RL Brainard, P Trefonas Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 88 | 2006 |
Orientation control in thin films of a high-χ block copolymer with a surface active embedded neutral layer J Zhang, MB Clark, C Wu, M Li, P Trefonas III, PD Hustad Nano letters 16 (1), 728-735, 2016 | 80 | 2016 |
Dilute solution physical properties of organosilane polymers PM Cotts, RD Miller, PT Trefonas III, R West, GN Fickes Macromolecules 20 (5), 1046-1052, 1987 | 75 | 1987 |
Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same PD Hustad, P Trefonas III, SW Chang US Patent 11,021,630, 2021 | 74 | 2021 |
Methods utilizing antireflective coating compositions with exposure under 200 nm TG Adams, EK Pavelchek, RF Sinta, M DoCanto, RF Blacksmith, ... US Patent 6,410,209, 2002 | 73 | 2002 |
Novel strategy for photopatterning emissive polymer brushes for organic light emitting diode applications ZA Page, B Narupai, CW Pester, R Bou Zerdan, A Sokolov, DS Laitar, ... ACS central science 3 (6), 654-661, 2017 | 70 | 2017 |
Simple method for measuring acid generation quantum efficiency at 193 nm CR Szmanda, RJ Kavanagh, JF Bohland, JF Cameron, P Trefonas III, ... Advances in Resist Technology and Processing XVI 3678, 857-866, 1999 | 68 | 1999 |
Soluble polysilanes: an interesting new class of radiation sensitive materials RD Miller, D Hofer, GN Fickes, CG Willson, E Marinero, P Trefonas III, ... Polymer Engineering & Science 26 (16), 1129-1134, 1986 | 67 | 1986 |