| Nonadiabatic study of dynamic electronic effects during brittle fracture of silicon PL Theofanis, A Jaramillo-Botero, WA Goddard III, H Xiao Physical review letters 108 (4), 045501, 2012 | 40 | 2012 |
| Understanding β-hydride eliminations from heteroatom functional groups PL Theofanis, WA Goddard III Organometallics 30 (18), 4941-4948, 2011 | 23 | 2011 |
| Electron dynamics of shocked polyethylene crystal PL Theofanis, A Jaramillo-Botero, WA Goddard III, TR Mattsson, ... Physical Review B 85 (9), 094109, 2012 | 21 | 2012 |
| Orientational preference in multilayer block copolymer nanomeshes with respect to layer-to-layer commensurability CL Carpenter, S Nicaise, PL Theofanis, D Shykind, KK Berggren, ... Macromolecules 50 (20), 8258-8266, 2017 | 16 | 2017 |
| Non-adiabatic dynamics modeling framework for materials in extreme conditions H Xiao, A Jaramillo-Botero, PL Theofanis, WA Goddard III Mechanics of Materials 90, 243-252, 2015 | 11 | 2015 |
| Large-scale molecular simulations of hypervelocity impact of materials A Jaramillo-Botero, Q An, PL Theofanis, WA Goddard III Procedia Engineering 58, 167-176, 2013 | 10 | 2013 |
| In silico design of a thermal atomic layer etch process of cobalt S Kondati Natarajan, M Nolan, P Theofanis, C Mokhtarzadeh, ... Journal of Vacuum Science & Technology A 39 (2), 2021 | 5 | 2021 |
| Adhesion limits and design criteria for nanorelays KL Lin, GLW Cross, P Gleeson, JP de Silva, A Levander, JA Munoz, ... IEEE Transactions on Electron Devices 63 (1), 465-470, 2015 | 5 | 2015 |
| Mechanism of thermal atomic layer etch of W metal using sequential oxidation and chlorination: A first-principles study S Kondati Natarajan, M Nolan, P Theofanis, C Mokhtarzadeh, ... ACS applied materials & interfaces 12 (32), 36670-36680, 2020 | 4 | 2020 |
| Ab initio analysis of nucleation reactions during tungsten atomic layer deposition on Si (100) and W (110) substrates MJ King, PL Theofanis, PC Lemaire, EE Santiso, GN Parsons Journal of Vacuum Science & Technology A 36 (6), 2018 | 4 | 2018 |
| Modeling photon, electron, and chemical interactions in a model hafnium oxide nanocluster EUV photoresist PL Theofanis, JM Blackwell, ME Krysak, F Gstrein Extreme Ultraviolet (EUV) Lithography XI 11323, 92-105, 2020 | 3 | 2020 |
| Monte Carlo EUV stochastic simulator (MESS): a chemistry-oriented lithography simulator PL Theofanis, O Tazetdinov Optical and EUV Nanolithography XXXV, PC120510I, 2022 | 2 | 2022 |
| Magnetic nanomechanical devices for stiction compensation JA Munoz, DE Nikonov, KJ Kuhn, P Theofanis, C Pawashe, K Lin, S Kim US Patent 9,926,193, 2018 | 2 | 2018 |
| Transistors with monocrystalline metal chalcogenide channel materials C Naylor, C Dorow, K O'brien, S Lee, K Maxey, AV Penumatcha, T Gosavi, ... US Patent App. 17/129,486, 2022 | 1 | 2022 |
| Vertical interconnect methods for stacked device architectures using direct self assembly with high operational parallelization and improved scalability AD Lilak, P Theofanis, P Morrow, R Mehandru, SM Cea US Patent 11,011,537, 2021 | 1 | 2021 |
| Supplemental information for: non-adiabatic study of dynamic electronic effects during brittle fracture of silicon PL Theofanis, A Jaramillo-Botero, WA Goddard III, H Xiao Physical Review Letters 108 (4), 045501, 2011 | 1 | 2011 |
| Atomistic Modeling Approach for Predicting Association of Photoacid Generators in Extreme Ultraviolet Polymeric Photoresists BP Prajwal, JM Blackwell, P Theofanis, FA Escobedo Chemistry of Materials 35 (21), 9050-9063, 2023 | | 2023 |
| Thin film transistors having a spin-on 2d channel material CH Naylor, K Maxey, KP O'brien, C Dorow, S Lee, AV Penumatcha, ... US Patent App. 17/485,176, 2023 | | 2023 |
| Chain scission resist compositions for EUV lithography applications L Doyle, M Krysak, P Theofanis, J Blackwell, E Han US Patent 11,262,654, 2022 | | 2022 |
| Euv patterning methods, structures, and materials M Krysak, J Blackwell, L Doyle, B Zaccheo, P Theofanis, M Robinson, ... US Patent App. 17/308,813, 2021 | | 2021 |
William A Goddard IIIProfessor Chemistry, Materials Science, Applied PhysicsVerified email at caltech.edu
