Amir Tavakkoli K. G.
Amir Tavakkoli K. G.
Canon Nanotechnologies
Verified email at cnt.canon.com - Homepage
TitleCited byYear
Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer Films
AT KG, KW Gotrik, AF Hannon, A Alexander-Katz, CA Ross, KK Berggren
Science 336 (6086), 1294-1298, 2012
2142012
MoS2 Field-Effect Transistor with Sub-10 nm Channel Length
A Nourbakhsh, A Zubair, RN Sajjad, A Tavakkoli KG, W Chen, S Fang, ...
Nano Letters 16 (12), 7798-7806, 2016
1572016
Generation of pronounced Fano resonances and tuning of subwavelength spatial light distribution in plasmonic pentamers
M Rahmani, B Lukiyanchuk, B Ng, A Tavakkoli KG, YF Liew, MH Hong
Optics express 19 (6), 4949-4956, 2011
862011
Multilayer block copolymer meshes by orthogonal self-assembly
AT KG, SM Nicaise, KR Gadelrab, A Alexander-Katz, CA Ross, ...
Nature Communications 7, 2016
472016
Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer
AT KG, AF Hannon, KW Gotrik, A Alexander‐Katz, CA Ross, KK Berggren
Advanced Materials, 2012
282012
Magnetostatic interaction effects in switching field distribution of conventional and staggered bit-patterned media
M Ranjbar, AT KG, SN Piramanayagam, KP Tan, R Sbiaa, SK Wong, ...
Journal of Physics D: Applied Physics 44 (26), 265005, 2011
212011
Path to achieve sub-10-nm half-pitch using electron beam lithography
A Tavakkoli KG, SN Piramanayagam, M Ranjbar, R Sbiaa, TC Chong
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
212011
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly
A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ...
Small 10 (3), 493-499, 2014
182014
Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly
A Tavakkoli KG, SM Nicaise, AF Hannon, KW Gotrik, A Alexander‐Katz, ...
Small 10 (3), 493-499, 2014
172014
Removable templates for directed self assembly
ATK Ghariehali, SM Nicaise, KK Berggren, KW Gotrik, CA Ross
US Patent 9,478,429, 2016
122016
Characterization of high‐density bit‐patterned media using ultra‐high resolution magnetic force microscopy
SN Piramanayagam, M Ranjbar, R Sbiaa, A Tavakkoli KG, TC Chong
physica status solidi (RRL)–Rapid Research Letters 6 (3), 141-143, 2012
112012
Comparison of fine and conventional blanking based on ductile fracture criteria
FR Biglari, AT Kermani, MH Parsa, KM Nikbin, NP O’Dowd
ASME 7th Biennial Conference on Engineering Systems Design and Analysis, 265-270, 2004
92004
Serially connected monolayer MoS2FETs with channel patterned by a 7.5 nm resolution directed self-assembly lithography
A Nourbakhsh, A Zubair, A Tavakkoli, R Sajjad, X Ling, M Dresselhaus, ...
2016 IEEE Symposium on VLSI Technology, 1-2, 2016
72016
Reverse nanoimprint lithography for fabrication of nanostructures
KG Tavakkoli, M Ranjbar, SN Piramanayagam, SK Wong, WC Poh, ...
Nanoscience and Nanotechnology Letters 4 (8), 835-838, 2012
72012
Self-assembly of block copolymers by graphoepitaxy
SM Nicaise, KGA Tavakkoli, KK Berggren
Directed Self-assembly of Block Co-polymers for Nano-manufacturing, 199-232, 2015
32015
Rapid shear alignment of sub-10 nm cylinder-forming block copolymer films based on thermal expansion mismatch
SM Nicaise, KR Gadelrab, AT KG, CA Ross, A Alexander-Katz, ...
Nano Futures 1 (3), 035006, 2018
12018
Extrusion Control by Capillary Force Reduction
EB Fletcher, TP Estrada, ATK Ghariehali
US Patent App. 15/884,642, 2019
2019
APPARATUS FOR IMPRINT LITHOGRAPHY COMPRISING A LOGIC ELEMENT CONFIGURED TO GENERATE A FLUID DROPLET PATTERN AND A METHOD OF USING SUCH APPARATUS
T Kermani, G Amir, EB Fletcher
US Patent App. 15/804,433, 2019
2019
Nanoimprint template with light blocking material and method of fabrication
ATK Ghariehali, EB Fletcher
US Patent App. 15/720,308, 2019
2019
Scaling and carrier transport properties of monolayer MoS2 transistors
A Nourbakhsh, A Zubair, R Sajjad, A Tavakkoli, X Ling, M Dresselhaus, ...
APS Meeting Abstracts, 2017
2017
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