| Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films RL Bruce, F Weilnboeck, T Lin, RJ Phaneuf, GS Oehrlein, BK Long, ... Journal of Applied Physics 107 (8), 2010 | 123 | 2010 |
| Study of ion and vacuum ultraviolet-induced effects on styrene-and ester-based polymers exposed to argon plasma RL Bruce, S Engelmann, T Lin, T Kwon, RJ Phaneuf, GS Oehrlein, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 75 | 2009 |
| An optimal quasisuperlattice design to further improve thermal stability of tantalum nitride diffusion barriers GS Chen, SC Huang, ST Chen, TJ Yang, PY Lee, JH Jou, TC Lin Applied Physics Letters 76 (20), 2895-2897, 2000 | 42 | 2000 |
| On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists RL Bruce, F Weilnboeck, T Lin, RJ Phaneuf, GS Oehrlein, BK Long, ... Journal of Vacuum Science & Technology B 29 (4), 2011 | 29 | 2011 |
| Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing AR Pal, RL Bruce, F Weilnboeck, S Engelmann, T Lin, MS Kuo, ... Journal of Applied Physics 105 (1), 2009 | 24 | 2009 |
| Mechanical responses of breast cancer cells to substrates of varying stiffness revealed by single-cell measurements F Tian, TC Lin, L Wang, S Chen, X Chen, PM Yiu, OKC Tsui, J Chu, ... The Journal of Physical Chemistry Letters 11 (18), 7643-7649, 2020 | 16 | 2020 |
| Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma RL Bruce, T Lin, RJ Phaneuf, GS Oehrlein, W Bell, B Long, CG Willson Journal of Vacuum Science & Technology B 28 (4), 751-757, 2010 | 16 | 2010 |
| Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: a beam system study of P4MS and PαMS D Nest, TY Chung, JJ Vegh, DB Graves, RL Bruce, T Lin, RJ Phaneuf, ... Journal of Physics D: Applied Physics 43 (8), 085204, 2010 | 16 | 2010 |
| Direct and quantitative evidence for buckling instability as a mechanism for roughening of polymer during plasma etching TC Lin, RL Bruce, GS Oehrlein, RJ Phaneuf, HC Kan Applied Physics Letters 100 (23), 2012 | 13 | 2012 |
| Dependence of membrane tether strength on substrate rigidity probed by single-cell force spectroscopy J Li, SS Wijeratne, TE Nelson, TC Lin, X He, X Feng, N Nikoloutsos, ... The Journal of Physical Chemistry Letters 11, 4173-4178, 2020 | 7 | 2020 |
| Nest D and Graves DB RL Bruce, F Weilnboeck, T Lin, RJ Phaneuf, GS Oehrlein, BK Long, ... J. Appl. Phys. 2010, 107, 2010 | 5 | 2010 |
| Effects of Substrate Rigidity on Cancer Cell Membrane Tether Strength Probed Using Single Cell Force Spectroscopy CH Kiang, S Wijeratne, J Li, TC Lin, I Lian, N Nikoloutsos, R Fang, K Jiang Bulletin of the American Physical Society, 2024 | | 2024 |
| 町 UNIVERST OF SCIENCE| LIBRARY Y Wang, RCW Wong, M Xie Environmental Science and Technology 55 (13), 8573-8582, 2021 | | 2021 |
| Quantifying Substrate Rigidity Effects on Cancer Cell Mechanics using Single Cell Force Spectroscopy TC Lin, J Li, SS Wijeratne, X He, X Feng, N Nikoloutsos, R Fang, K Jiang, ... Biophysical Journal 118 (3), 604a, 2020 | | 2020 |
| Different Mechanical Responses to Substrate Stiffness between Cancer Cells and Normal Cells F Tian, TC Lin, L Wang, S Chen, C Yan, PM Yiu, OKC Tsui, J Chu, ... Biophysical Journal 118 (3), 249a, 2020 | | 2020 |
| Mechanical Responses of Cancer Cells to Different Matrices Measured by AFM and FRET F Tian, TC Lin, L Wang, S Chen, J Chu, CH Kiang, H Park Biophysical Journal 116 (3), 531a, 2019 | | 2019 |
| Nanomechanical properties and buckling instability of plasma induced damaged layers on polystyrene TC Lin University of Maryland, College Park, 2012 | | 2012 |
| Atomic force microscopy determination of the elastic modulus of nanometer thick, ultra-stiff modified layers after plasma etching of a polymer film T Lin, HC Kan, RL Bruce, GS Oehrlein, RJ Phaneuf AVS 58th Annual International Symposium and Exhibition, 2011 | | 2011 |
| Length-scale-dependent behavior of a nano-patterned resist material during thermal annealing and plasma etching TC Lin, RL Bruce, F Weilnboeck, GS Oehrlein, B Shefter, BK Long, W Bell, ... 2009 MRS Fall Meeting, 2009 | | 2009 |
| Fundamental Etching and Roughening Mechanisms of Photoresist Polymers during Plasma Processing D Nest, TY Chung, D Graves, F Weilnboeck, R Bruce, TC Lin, R Phaneuf, ... APS March Meeting Abstracts, Z28. 001, 2009 | | 2009 |
GS OehrleinUniversity of MarylandVerified email at umd.edu
