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Robert D. Allen
Robert D. Allen
IBM Almaden Research Center
Verified email at us.ibm.com
Title
Cited by
Cited by
Year
Preparation of high purity, anionic polymerization grade alkyl methacrylate monomers
RD Allen, TE Long, JE McGrath
Polymer Bulletin 15, 127-134, 1986
2751986
Supercritical CO2 Processing for Submicron Imaging of Fluoropolymers
N Sundararajan, S Yang, K Ogino, S Valiyaveettil, Wang, X Zhou, ...
Chemistry of materials 12 (1), 41-48, 2000
1702000
Limits to etch resistance for 193-nm single-layer resists
RR Kunz, SC Palmateer, AR Forte, RD Allen, GM Wallraff, RA Di Pietro, ...
Advances in Resist Technology and Processing XIII 2724, 365-376, 1996
1631996
Expanding plastics recycling technologies: chemical aspects, technology status and challenges
H Li, HA Aguirre-Villegas, RD Allen, X Bai, CH Benson, GT Beckham, ...
Green Chemistry 24 (23), 8899-9002, 2022
1622022
193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
RD Allen, GM Wallraff, RA Di Pietro, DC Hofer, RR Kunz
Advances in Resist Technology and Processing XII 2438, 474-485, 1995
1321995
Resolution and etch resistance of a family of 193nm positive resists
RD Allen, IY Wan, GM Wallraff, RA DiPietro, DC Hofer, RR Kunz
Journal of Photopolymer Science and Technology 8 (4), 623-626, 1995
1261995
Acid-catalyzed single-layer resists for ArF lithography
RR Kunz, RD Allen, WD Hinsberg, GM Wallraff
Optical Engineering 32 (10), 2363-2367, 1993
1171993
Process for generating negative tone resist images utilizing carbon dioxide critical fluid
RD Allen, GM Wallraff
US Patent 5,665,527, 1997
1101997
Bifunctional hydrogel coatings for water purification membranes: Improved fouling resistance and antimicrobial activity
YH La, BD McCloskey, R Sooriyakumaran, A Vora, B Freeman, M Nassar, ...
Journal of Membrane Science 372 (1-2), 285-291, 2011
1042011
Novel thin film composite membrane containing ionizable hydrophobes: pH-dependent reverse osmosis behavior and improved chlorine resistance
YH La, R Sooriyakumaran, DC Miller, M Fujiwara, Y Terui, K Yamanaka, ...
Journal of Materials Chemistry 20 (22), 4615-4620, 2010
982010
Thermal probe maskless lithography for 27.5 nm half-pitch Si technology
LL Cheong, P Paul, F Holzner, M Despont, DJ Coady, JL Hedrick, R Allen, ...
Nano letters 13 (9), 4485-4491, 2013
962013
Photoresists for 193-nm lithography
RD Allen, GM Wallraff, DC Hofer, RR Kunz
IBM journal of research and development 41 (1.2), 95-104, 1997
941997
Imaging polymers with supercritical carbon dioxide
CK Ober, AH Gabor, P Gallagher‐Wetmore, RD Allen
Advanced Materials 9 (13), 1039-1043, 1997
941997
Polymer design for 157-nm chemically amplified resists
H Ito, GM Wallraff, PJ Brock, N Fender, HD Truong, G Breyta, DC Miller, ...
Advances in Resist Technology and Processing XVIII 4345, 273-284, 2001
852001
Supercritical fluid processing: a new dry technique for photoresist developing
PM Gallagher-Wetmore, GM Wallraff, RD Allen
Advances in Resist Technology and Processing XII 2438, 694-708, 1995
831995
High performance acrylic polymers for chemically amplified photoresist applications
RD Allen, GM Wallraff, WD Hinsberg, LL Simpson
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1991
821991
Acid generation and acid diffusion in photoresist films
DR McKean, RD Allen, PH Kasai, UP Schaedeli, SA MacDonald
Advances in Resist Technology and Processing IX 1672, 94-103, 1992
781992
Protecting groups for 193-nm photoresists
RD Allen, R Sooriyakumaran, J Opitz, GM Wallraff, RA Di Pietro, G Breyta, ...
Advances in Resist Technology and Processing XIII 2724, 334-343, 1996
751996
New single-layer positive photoresists for 193-nm photolithography
U Okoroanyanwu, T Shimokawa, JD Byers, DR Medeiros, CG Willson, ...
Advances in Resist Technology and Processing XIV 3049, 92-103, 1997
721997
Performance properties of near-monodisperse Novolak resins
RD Allen, KR Chen, PM Gallagher-Wetmore
Advances in Resist Technology and Processing XII 2438, 250-260, 1995
711995
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