| Block copolymer lithography CM Bates, MJ Maher, DW Janes, CJ Ellison, CG Willson Macromolecules 47 (1), 2-12, 2014 | 676 | 2014 |
| Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains CM Bates, T Seshimo, MJ Maher, WJ Durand, JD Cushen, LM Dean, ... Science 338 (6108), 775-779, 2012 | 451 | 2012 |
| Design of high‐χ block copolymers for lithography WJ Durand, G Blachut, MJ Maher, S Sirard, S Tein, MC Carlson, Y Asano, ... Journal of Polymer Science Part A: Polymer Chemistry 53 (2), 344-352, 2015 | 170 | 2015 |
| Interfacial Design for Block Copolymer Thin Films MJ Maher, CM Bates, G Blachut, S Sirard, JL Self, MC Carlson, LM Dean, ... Chemistry of Materials 26 (3), 1471-1479, 2014 | 132 | 2014 |
| Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae AP Lane, XM Yang, MJ Maher, G Blachut, Y Asano, Y Someya, ... ACS nano 11 (8), 7656-7665, 2017 | 123 | 2017 |
| Consequences of Grafting Density on the Linear Viscoelastic Behavior of Graft Polymers IN Haugan, MJ Maher, AB Chang, TP Lin, RH Grubbs, MA Hillmyer, ... ACS Macro Letters 7 (5), 525-530, 2018 | 117 | 2018 |
| Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films MJ Maher, CT Rettner, CM Bates, G Blachut, MC Carlson, WJ Durand, ... ACS applied materials & interfaces 7 (5), 3323-3328, 2015 | 83 | 2015 |
| Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST J Cushen, L Wan, G Blachut, MJ Maher, TR Albrecht, CJ Ellison, ... ACS applied materials & interfaces 7 (24), 13476-13483, 2015 | 70 | 2015 |
| Structure, Stability, and Reorganization of 0.5 L0 Topography in Block Copolymer Thin Films MJ Maher, JL Self, P Stasiak, G Blachut, CJ Ellison, MW Matsen, ... ACS nano 10 (11), 10152-10160, 2016 | 43 | 2016 |
| Physical Aging of Polylactide-Based Graft Block Polymers IN Haugan, B Lee, MJ Maher, A Zografos, HJ Schibur, SD Jones, ... Macromolecules 52 (22), 8878-8894, 2019 | 41 | 2019 |
| Experimental and modeling study of domain orientation in confined block copolymer thin films WJ Durand, MC Carlson, MJ Maher, G Blachut, LJ Santos, S Tein, ... Macromolecules 49 (1), 308-316, 2016 | 40 | 2016 |
| A hybrid chemo-/grapho-epitaxial alignment strategy for defect reduction in sub-10 nm directed self-assembly of silicon-containing block copolymers G Blachut, SM Sirard, MJ Maher, Y Asano, Y Someya, AP Lane, ... Chemistry of Materials 28 (24), 8951-8961, 2016 | 37 | 2016 |
| Characterizing the Interface Scaling of High χ Block Copolymers near the Order–Disorder Transition DF Sunday, MJ Maher, AF Hannon, CD Liman, S Tein, G Blachut, ... Macromolecules 51 (1), 173-180, 2018 | 36 | 2018 |
| Photopatternable Interfaces for Block Copolymer Lithography MJ Maher, CM Bates, G Blachut, MC Carlson, JL Self, DW Janes, ... ACS Macro Letters 3 (8), 824-828, 2014 | 31 | 2014 |
| Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers MJ Maher, K Mori, SM Sirard, AM Dinhobl, CM Bates, E Gurer, G Blachut, ... ACS Macro Letters 5, 391-395, 2016 | 29 | 2016 |
| Photopatterning of Block Copolymer Thin Films AP Lane, MJ Maher, CG Willson, CJ Ellison ACS Macro Letters 5 (4), 460-465, 2016 | 26 | 2016 |
| High chi block copolymer DSA to improve pattern quality for FinFET device fabrication HY Tsai, H Miyazoe, A Vora, T Magbitang, N Arellano, CC Liu, MJ Maher, ... Advances in Patterning Materials and Processes XXXIII 9779, 128-134, 2016 | 22 | 2016 |
| Block copolymer orientation control using a top-coat surface treatment T Seshimo, CM Bates, LM Dean, JD Cushen, WJ Durand, MJ Maher, ... Journal of Photopolymer Science and Technology 25 (1), 125-130, 2012 | 22 | 2012 |
| The Order–Disorder Transition in Graft Block Copolymers MJ Maher, SD Jones, A Zografos, J Xu, HJ Schibur, FS Bates Macromolecules 51 (1), 232-241, 2018 | 19 | 2018 |
| Anhydride copolymer top coats for orientation control of thin film block copolymers CG Willson, CJ Ellison, T Seshimo, J Cushen, CM Bates, L Dean, ... US Patent 9,314,819, 2016 | 15 | 2016 |
