| Phase-shifting point diffraction interferometer H Medecki, E Tejnil, KA Goldberg, J Bokor Optics letters 21 (19), 1526-1528, 1996 | 212 | 1996 |
| Fourier-transform method of phase-shift determination KA Goldberg, J Bokor Applied optics 40 (17), 2886-2894, 2001 | 155 | 2001 |
| Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor Applied Optics 38 (35), 7252-7263, 1999 | 146 | 1999 |
| Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ... Optics letters 28 (17), 1534-1536, 2003 | 125 | 2003 |
| Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ... Emerging Lithographic Technologies VIII 5374, 881-891, 2004 | 110 | 2004 |
| Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system PP Naulleau, KA Goldberg, J Bokor Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 91 | 2000 |
| Critical challenges for EUV resist materials PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011 | 87 | 2011 |
| Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa Applied Optics 42 (5), 820-826, 2003 | 86 | 2003 |
| System integration and performance of the EUV engineering test stand DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ... Emerging Lithographic Technologies V 4343, 19-37, 2001 | 78 | 2001 |
| EUV engineering test stand DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ... Emerging Lithographic Technologies IV 3997, 48-69, 2000 | 78 | 2000 |
| At-wavelength interferometry for extreme ultraviolet lithography E Tejnil, KA Goldberg, SH Lee, H Medecki, PJ Batson, PE Denham, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997 | 75 | 1997 |
| Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ... Optics letters 34 (3), 271-273, 2009 | 74 | 2009 |
| Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ... IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999 | 70 | 1999 |
| Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements KA Goldberg, A Barty, Y Liu, P Kearney, Y Tezuka, T Terasawa, JS Taylor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 66 | 2006 |
| Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 61 | 2002 |
| Modal wavefront reconstruction from its gradient I Mochi, KA Goldberg Applied Optics 54 (12), 3780-3785, 2015 | 60 | 2015 |
| Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 60 | 2004 |
| EUV microexposures at the ALS using the 0.3-NA MET projection optics P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ... Emerging Lithographic Technologies IX 5751, 56-63, 2005 | 58 | 2005 |
| At-wavelength alignment and testing of the 0.3 NA MET optic KA Goldberg, PP Naulleau, PE Denham, SB Rekawa, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 58 | 2004 |
| Characterization of the accuracy of EUV phase-shifting point diffraction interferometry PP Naulleau, KA Goldberg, SH Lee, CHC Chang, CJ Bresloff, PJ Batson, ... Emerging Lithographic Technologies II 3331, 114-123, 1998 | 57 | 1998 |
Patrick NaulleauLawrence Berkeley National LabVerified email at lbl.gov
