| Catalyst support effects on hydrogen spillover W Karim, C Spreafico, A Kleibert, J Gobrecht, J VandeVondele, Y Ekinci, ... Nature 541 (7635), 68-71, 2017 | 849 | 2017 |
| Symmetry breaking in a plasmonic metamaterial at optical wavelength A Christ, OJF Martin, Y Ekinci, NA Gippius, SG Tikhodeev Nano letters 8 (8), 2171-2175, 2008 | 278 | 2008 |
| Plasmon resonances of aluminum nanoparticles and nanorods Y Ekinci, HH Solak, JF Löffler Journal of Applied Physics 104 (8), 2008 | 273 | 2008 |
| Deep-UV surface-enhanced resonance Raman scattering of adenine on aluminum nanoparticle arrays SK Jha, Z Ahmed, M Agio, Y Ekinci, JF Löffler Journal of the American Chemical Society 134 (4), 1966-1969, 2012 | 271 | 2012 |
| Three-dimensional Si/Ge quantum dot crystals D Grützmacher, T Fromherz, C Dais, J Stangl, E Müller, Y Ekinci, ... Nano letters 7 (10), 3150-3156, 2007 | 233 | 2007 |
| Controlling the Fano interference in a plasmonic lattice A Christ, Y Ekinci, HH Solak, NA Gippius, SG Tikhodeev, OJF Martin Physical Review B—Condensed Matter and Materials Physics 76 (20), 201405, 2007 | 220 | 2007 |
| Sub-10 nm patterning using EUV interference lithography B Päivänranta, A Langner, E Kirk, C David, Y Ekinci Nanotechnology 22 (37), 375302, 2011 | 216 | 2011 |
| Bilayer Al wire-grids as broadband and high-performance polarizers Y Ekinci, HH Solak, C David, H Sigg Optics express 14 (6), 2323-2334, 2006 | 203 | 2006 |
| Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5 nm) B Cardineau, R Del Re, M Marnell, H Al-Mashat, M Vockenhuber, Y Ekinci, ... Microelectronic engineering 127, 44-50, 2014 | 159 | 2014 |
| Beyond EUV lithography: a comparative study of efficient photoresists' performance N Mojarad, J Gobrecht, Y Ekinci Scientific reports 5 (1), 1-7, 2015 | 155 | 2015 |
| Nonlinear superchiral meta-surfaces: tuning chirality and disentangling non-reciprocity at the nanoscale VK Valev, JJ Baumberg, B De Clercq, N Braz, X Zheng, EJ Osley, ... Advanced Materials (Deerfield Beach, Fla.) 26 (24), 4074, 2014 | 153 | 2014 |
| Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications N Mojarad, J Gobrecht, Y Ekinci Microelectronic Engineering 143, 55-63, 2015 | 119 | 2015 |
| Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond N Mojarad, M Hojeij, L Wang, J Gobrecht, Y Ekinci Nanoscale 7 (9), 4031-4037, 2015 | 108 | 2015 |
| Engineering metal adhesion layers that do not deteriorate plasmon resonances T Siegfried, Y Ekinci, OJF Martin, H Sigg ACS nano 7 (3), 2751-2757, 2013 | 107 | 2013 |
| High aspect ratio plasmonic nanostructures for sensing applications B Päivänranta, H Merbold, R Giannini, L Büchi, S Gorelick, C David, ... ACS nano 5 (8), 6374-6382, 2011 | 104 | 2011 |
| Photon-beam lithography reaches 12.5 nm half-pitch resolution HH Solak, Y Ekinci, P Käser, S Park Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 101 | 2007 |
| Gap plasmons and near-field enhancement in closely packed sub-10 nm gap resonators T Siegfried, Y Ekinci, OJF Martin, H Sigg Nano letters 13 (11), 5449-5453, 2013 | 92 | 2013 |
| Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond Y Ekinci, M Vockenhuber, M Hojeij, L Wang, N Mojarad Extreme Ultraviolet (EUV) Lithography IV 8679, 246-256, 2013 | 91 | 2013 |
| Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors T Siegfried, Y Ekinci, HH Solak, OJF Martin, H Sigg Applied Physics Letters 99 (26), 2011 | 88 | 2011 |
| Electric and magnetic resonances in arrays of coupled gold nanoparticle in-tandem pairs Y Ekinci, A Christ, M Agio, OJF Martin, HH Solak, JF Löffler Optics express 16 (17), 13287-13295, 2008 | 87 | 2008 |
Dimitris KazazisPaul Scherrer InstitutVerified email at psi.ch
