| Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms B Bruneau, T Gans, D O’Connell, A Greb, EV Johnson, JP Booth Physical review letters 114 (12), 125002, 2015 | 127 | 2015 |
| Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4 S Brandt, B Berger, E Schüngel, I Korolov, A Derzsi, B Bruneau, ... Plasma Sources Science and Technology 25 (4), 045015, 2016 | 67 | 2016 |
| Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms B Bruneau, T Novikova, T Lafleur, JP Booth, EV Johnson Plasma Sources Science and Technology 23 (6), 065010, 2014 | 66 | 2014 |
| Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4 B Bruneau, T Lafleur, T Gans, D O’Connell, A Greb, I Korolov, A Derzsi, ... Plasma Sources Science and Technology 25 (1), 01LT02, 2015 | 53 | 2015 |
| Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas B Bruneau, T Novikova, T Lafleur, JP Booth, EV Johnson Plasma Sources Science and Technology 24 (1), 015021, 2014 | 49 | 2014 |
| Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges A Derzsi, B Bruneau, AR Gibson, E Johnson, D O’Connell, T Gans, ... Plasma Sources Science and Technology 26 (3), 034002, 2017 | 43 | 2017 |
| Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects E Schüngel, I Korolov, B Bruneau, A Derzsi, E Johnson, D O’Connell, ... Journal of Physics D: Applied Physics 49 (26), 265203, 2016 | 33 | 2016 |
| Growth mechanisms study of microcrystalline silicon deposited by SiH4/H2 plasma using tailored voltage waveforms B Bruneau, J Wang, JC Dornstetter, EV Johnson Journal of Applied Physics 115 (8), 2014 | 30 | 2014 |
| Slope and amplitude asymmetry effects on low frequency capacitively coupled carbon tetrafluoride plasmas B Bruneau, I Korolov, T Lafleur, T Gans, D O'Connell, A Greb, A Derzsi, ... Journal of Applied Physics 119 (16), 2016 | 23 | 2016 |
| Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms B Bruneau, T Lafleur, JP Booth, E Johnson Plasma Sources Science and Technology 25 (2), 025006, 2016 | 22 | 2016 |
| Understanding the amorphous-to-microcrystalline silicon transition in SiF4/H2/Ar gas mixtures JC Dornstetter, B Bruneau, P Bulkin, EV Johnson, P Roca i Cabarrocas The Journal of Chemical Physics 140 (23), 2014 | 21 | 2014 |
| Ion energy threshold in low-temperature silicon epitaxy for thin-film crystalline photovoltaics B Bruneau, R Cariou, JC Dornstetter, M Lepecq, JL Maurice, ... IEEE Journal of photovoltaics 4 (6), 1361-1367, 2014 | 20 | 2014 |
| Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases Z Donkó, A Derzsi, I Korolov, P Hartmann, S Brandt, J Schulze, B Berger, ... Plasma Physics and Controlled Fusion 60 (1), 014010, 2018 | 18 | 2018 |
| Effect of ion energy on microcrystalline silicon material and devices: a study using tailored voltage waveforms B Bruneau, M Lepecq, J Wang, JC Dornstetter, JL Maurice, EV Johnson IEEE Journal of Photovoltaics 4 (6), 1354-1360, 2014 | 18 | 2014 |
| Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry B Bruneau, P Diomede, DJ Economou, S Longo, T Gans, D O’Connell, ... Plasma Sources Science and Technology 25 (4), 045019, 2016 | 16 | 2016 |
| Material and growth mechanism studies of microcrystalline silicon deposited from SiF4/H2/Ar gas mixtures JC Dornstetter, J Wang, B Bruneau, EV Johnson, P Roca i Cabarrocas Canadian Journal of Physics 92 (7/8), 740-743, 2014 | 16 | 2014 |
| Excitation of Ar, O2, and SF6/O2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron … G Fischer, K Ouaras, E Drahi, B Bruneau, EV Johnson Plasma Sources Science and Technology 27 (7), 074003, 2018 | 10 | 2018 |
| Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control P Diomede, B Bruneau, S Longo, E Johnson, JP Booth Plasma Sources Science and Technology 26 (7), 075007, 2017 | 10 | 2017 |
| Maskless and contactless patterned silicon deposition using a localized PECVD process R Leal, B Bruneau, P Bulkin, T Novikova, F Silva, N Habka, EV Johnson Plasma Sources Science and Technology 29 (2), 025023, 2020 | 7 | 2020 |
| Maskless interdigitated a-Si: H PECVD process on full M0 c-Si wafer: Homogeneity and passivation assessment K Ouaras, S Filonovich, B Bruneau, J Wang, M Ghosh, E Johnson Solar Energy Materials and Solar Cells 246, 111927, 2022 | 4 | 2022 |
Erik JohnsonLPICM CNRS Ecole PolytechniqueVerified email at polytechnique.edu
