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Dario L. Goldfarb
Dario L. Goldfarb
IBM TJ Watson Research Center (Yorktown Heights, NY - USA)
Verified email at us.ibm.com
Title
Cited by
Cited by
Year
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
DL Goldfarb, JJ de Pablo, PF Nealey, JP Simons, WM Moreau, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
2082000
Direct measurement of the reaction front in chemically amplified photoresists
EK Lin, CL Soles, DL Goldfarb, BC Trinque, SD Burns, RL Jones, ...
Science 297 (5580), 372-375, 2002
1222002
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
DL Goldfarb, AP Mahorowala, GM Gallatin, KE Petrillo, K Temple, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
1062004
Interfacial effects on moisture absorption in thin polymer films
BD Vogt, CL Soles, RL Jones, CY Wang, EK Lin, W Wu, SK Satija, ...
Langmuir 20 (13), 5285-5290, 2004
892004
Confinement effects on the spatial extent of the reaction front in ultrathin chemically amplified photoresists
DL Goldfarb, M Angelopoulos, EK Lin, RL Jones, CL Soles, JL Lenhart, ...
Journal of Vacuum Science and Technology-Section B-Microelectronics …, 2001
642001
Electrochemical protection of thin film electrodes in solid state nanopores
S Harrer, PS Waggoner, B Luan, A Afzali-Ardakani, DL Goldfarb, H Peng, ...
Nanotechnology 22 (27), 275304, 2011
602011
Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography
M Glodde, DL Goldfarb
US Patent 10,096,477, 2018
532018
Electrochemical characterization of thin film electrodes toward developing a DNA transistor
S Harrer, S Ahmed, A Afzali-Ardakani, B Luan, PS Waggoner, X Shao, ...
Langmuir 26 (24), 19191-19198, 2010
522010
Thin film confinement effects on the thermal properties of model photoresist polymers
CL Soles, EK Lin, JL Lenhart, RL Jones, W Wu, DL Goldfarb, ...
Journal of Vacuum Science and Technology-Section B-Microelectronics …, 2001
442001
Image collapse issues in photoresist
JP Simons, DL Goldfarb, M Angelopoulos, S Messick, WM Moreau, ...
PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 19-29, 2001
432001
Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure
JL Lenhart, RL Jones, EK Lin, CL Soles, W Wu, DA Fischer, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
402002
Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
JM Cotte, DL Goldfarb, KJ McCullough, WM Moreau, KR Pope, JP Simons, ...
US Patent 6,398,875, 2002
382002
Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions
Q Lin, DL Goldfarb, M Angelopoulos, SR Sriram, JS Moore
PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 78-86, 2001
382001
Dielectric and volumetric properties of supercritical carbon dioxide (1)+ methanol (2) mixtures at 323.15 K
DL Goldfarb, DP Fernández, HR Corti
Fluid phase equilibria 158, 1011-1019, 1999
381999
Pattern collapse mitigation strategies for EUV lithography
DL Goldfarb, RL Bruce, JJ Bucchignano, DP Klaus, MA Guillorn, CJ Wu
Extreme Ultraviolet (EUV) Lithography III 8322, 40-52, 2012
372012
Chemically amplified resists resolving 25 nm 1: 1 line: space features with EUV lithography
JW Thackeray, RA Nassar, R Brainard, D Goldfarb, T Wallow, Y Wei, ...
Emerging Lithographic Technologies XI 6517, 394-404, 2007
372007
Direct measurement of the counterion distribution within swollen polyelectrolyte films
VM Prabhu, BD Vogt, W Wu, JF Douglas, EK Lin, SK Satija, DL Goldfarb, ...
Langmuir 21 (15), 6647-6651, 2005
362005
Sub- half-pitch imaging with a low activation energy chemically amplified photoresist
GM Wallraff, DR Medeiros, M Sanchez, K Petrillo, WS Huang, C Rettner, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
362004
Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)
G Landie, Y Xu, S Burns, K Yoshimoto, M Burkhardt, L Zhuang, K Petrillo, ...
Advances in Resist Materials and Processing Technology XXVIII 7972, 51-62, 2011
352011
Process of drying a cast polymeric film disposed on a workpiece
DL Goldfarb, KJ Mccullough, DR Medeiros, WM Moreau, JP Simons, ...
US Patent 6,509,136, 2003
342003
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