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Edmund Schuengel
Edmund Schuengel
Evatec AG
Verified email at evatecnet.com
Title
Cited by
Cited by
Year
The electrical asymmetry effect in capacitively coupled radio-frequency discharges
U Czarnetzki, J Schulze, E Schüngel, Z Donkó
Plasma Sources Science and Technology 20 (2), 024010, 2011
261*2011
Possibilities of determining non-Maxwellian EEDFs from the OES line-ratios in low-pressure capacitive and inductive plasmas containing argon and krypton
XM Zhu, YK Pu, Y Celik, S Siepa, E Schüngel, D Luggenhölscher, ...
Plasma Sources Science and Technology 21 (2), 024003, 2012
193*2012
FAST TRACK COMMUNICATION: The electrical asymmetry effect in capacitively coupled radio frequency discharges-measurements of dc self bias, ion energy and ion flux
J Schulze, E Schüngel, U Czarnetzki
Journal of Physics D Applied Physics 42 (9), 2009
181*2009
The electrical asymmetry effect in capacitively coupled radio frequency discharges–measurements of dc self bias, ion energy and ion flux
J Schulze, E Schüngel, U Czarnetzki
Journal of Physics D: Applied Physics 42 (9), 092005, 2009
1812009
Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas
A Derzsi, I Korolov, E Schüngel, Z Donkó, J Schulze
Plasma Sources Science and Technology 24 (3), 034002, 2015
131*2015
The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges
J Schulze, E Schüngel, Z Donkó, U Czarnetzki
Plasma Sources Science and Technology 20 (1), 015017, 2011
1312011
Phase resolved optical emission spectroscopy: a non-intrusive diagnostic to study electron dynamics in capacitive radio frequency discharges
J Schulze, E Schüngel, Z Donkó, D Luggenhölscher, U Czarnetzki
Journal of Physics D: Applied Physics 43 (12), 124016, 2010
1282010
Secondary electrons in dual-frequency capacitive radio frequency discharges
J Schulze, Z Donkó, E Schüngel, U Czarnetzki
Plasma Sources Science and Technology 20 (4), 045007, 2011
1162011
Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments
Z Donkó, J Schulze, U Czarnetzki, A Derzsi, P Hartmann, I Korolov, ...
Plasma Physics and Controlled Fusion 54 (12), 124003, 2012
1102012
The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges
Z Donkó, J Schulze, P Hartmann, I Korolov, U Czarnetzki, E Schüngel
Applied Physics Letters 97 (8), 081501, 2010
1052010
The effect of the driving frequency on the confinement of beam electrons and plasma density in low-pressure capacitive discharges
S Wilczek, J Trieschmann, J Schulze, E Schuengel, RP Brinkmann, ...
Plasma Sources Science and Technology 24 (2), 024002, 2015
952015
Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model
J Schulze, E Schüngel, U Czarnetzki, Z Donkó
Journal of Applied Physics 106 (6), 063307, 2009
942009
Kinetic interpretation of resonance phenomena in low pressure capacitively coupled radio frequency plasmas
S Wilczek, J Trieschmann, D Eremin, RP Brinkmann, J Schulze, ...
Physics of Plasmas 23 (6), 063514, 2016
762016
The effect of ambipolar electric fields on the electron heating in capacitive RF plasmas
J Schulze, Z Donko, A Derzsi, I Korolov, E Schuengel
Plasma Sources Science and Technology 24 (1), 015019, 2014
762014
Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4
S Brandt, B Berger, E Schüngel, I Korolov, A Derzsi, B Bruneau, ...
Plasma Sources Science and Technology 25 (4), 045015, 2016
682016
Experimental observation and computational analysis of striations in electronegative capacitively coupled radio-frequency plasmas
YX Liu, E Schüngel, I Korolov, Z Donkó, YN Wang, J Schulze
Physical review letters 116 (25), 255002, 2016
652016
Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect
E Schüngel, QZ Zhang, S Iwashita, J Schulze, LJ Hou, YN Wang, ...
Journal of Physics D: Applied Physics 44 (28), 285205, 2011
652011
Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4
B Bruneau, T Lafleur, T Gans, D O’Connell, A Greb, I Korolov, A Derzsi, ...
Plasma Sources Science and Technology 25 (1), 01LT02, 2015
582015
Coupling effects in inductive discharges with radio frequency substrate biasing
J Schulze, E Schüngel, U Czarnetzki
Applied Physics Letters 100 (2), 024102, 2012
582012
The electrical asymmetry effect in geometrically asymmetric capacitive radio frequency plasmas
E Schüngel, D Eremin, J Schulze, T Mussenbrock, U Czarnetzki
Journal of Applied Physics 112 (5), 053302, 2012
572012
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