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Neda Dalili
Neda Dalili
Process Engineer, Intel
Verified email at intel.com
Title
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Cited by
Year
A review of surface engineering issues critical to wind turbine performance
N Dalili, A Edrisy, R Carriveau
Renewable and Sustainable energy reviews 13 (2), 428-438, 2009
7542009
Improving the wear resistance of Ti–6Al–4V/TiC composites through thermal oxidation (TO)
N Dalili, A Edrisy, K Farokhzadeh, J Li, J Lo, AR Riahi
Wear 269 (7-8), 590-601, 2010
832010
A route to low temperature growth of single crystal GaN on sapphire
P Motamedi, N Dalili, K Cadien
Journal of Materials Chemistry C 3 (28), 7428-7436, 2015
462015
Thermal and electrical stability of TaN x diffusion barriers for Cu metallization
N Dalili, Q Liu, DG Ivey
Journal of Materials Science 48, 489-501, 2013
172013
Microstructural characterization of the cycling behavior of electrodeposited manganese oxide supercapacitors using 3D electron tomography
N Dalili, MP Clark, E Davari, DG Ivey
Journal of Power Sources 328, 318-328, 2016
162016
Ta–Rh binary alloys as a potential diffusion barrier between Cu and Si: Stability and failure mechanism of the Ta–Rh amorphous structures
N Dalili, Q Liu, DG Ivey
Acta materialia 61 (14), 5365-5374, 2013
102013
In situ TEM study of stability of TaRhx diffusion barriers using a novel sample preparation method
N Dalili, P Li, M Kupsta, Q Liu, DG Ivey
Micron 58, 25-31, 2014
82014
A Cryo-XPS Study of Triammonium Citrate-KAuCl4-Na2SO3 Electroplating Solutions for Pb-Free Solder Packaging
N Dalili, A He, Q Liu, DG Ivey
Journal of electronic materials 39, 1554-1561, 2010
32010
Amorphous Ta-N as a Diffusion Barrier for Cu Metallization
N Dalili, Q Liu, DG Ivey
MRS Online Proceedings Library (OPL) 1335, mrss11-1335-o06-03, 2011
12011
Enhancement of mechanical and tribological properties of ti-6Al-4V alloy
N Dalili
University of Windsor, 2008
12008
Stability of TaRhx as a potential diffusion barrier for Cu metallization: capacitance–voltage tests after bias temperature stress
N Dalili, DG Ivey
Journal of Materials Science: Materials in Electronics 25, 897-905, 2014
2014
Design of Amorphous Diffusion Barriers for Cu Metallization
N Dalili
2014
Corrigendum to" Ta-Rh binary alloys as a potential diffusion barrier between Cu and Si: Stability and failure mechanism of the Ta-Rh amorphous structures"[Acta Mater. 61 (2013 …
N Dalili, Q Liu, DG Ivey
Acta Materialia 62, 286-286, 2014
2014
Stability of Glassy Ta-Rh Diffusion Barriers for Cu Metallization
N Dalili, Q Liu, DG Ivey
ECS Transactions 50 (32), 63, 2013
2013
Thermodynamic Stability and Diffusion Barrier Properties of Amorphous Ta-Rh Alloys for Cu Metallization
N Dalili, Q Liu, D Ivey
AIP Conference Proceedings, 2012
2012
Optimization of Solutions to Electrodeposit Sn-Based Pb-Free Solders
N Dalili, A He, Q Liu, D Ivey
Minerals, Metals and Materials Society/AIME, 420 Commonwealth Dr., P. O. Box …, 2010
2010
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