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| High-k dielectrics for future generation memory devices JA Kittl, K Opsomer, M Popovici, N Menou, B Kaczer, XP Wang, ... Microelectronic engineering 86 (7-9), 1789-1795, 2009 | 290 | 2009 |
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| Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy RL Puurunen, W Vandervorst, WFA Besling, O Richard, H Bender, ... Journal of applied physics 96 (9), 4878-4889, 2004 | 203 | 2004 |
| Characterization of ALCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy H Nohira, W Tsai, W Besling, E Young, J Pétry, T Conard, W Vandervorst, ... Journal of non-crystalline solids 303 (1), 83-87, 2002 | 202 | 2002 |
| Organic and perovskite solar cells for space applications I Cardinaletti, T Vangerven, S Nagels, R Cornelissen, D Schreurs, J Hruby, ... Solar Energy Materials and Solar Cells 182, 121-127, 2018 | 165 | 2018 |
| PET/MRI in head and neck cancer: initial experience I Platzek, B Beuthien-Baumann, M Schneider, V Gudziol, J Langner, ... European journal of nuclear medicine and molecular imaging 40, 6-11, 2013 | 162* | 2013 |
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| Atomic layer deposition of hafnium oxide on germanium substrates A Delabie, RL Puurunen, B Brijs, M Caymax, T Conard, B Onsia, ... Journal of applied physics 97 (6), 2005 | 132 | 2005 |
| Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural properties WFA Besling, E Young, T Conard, C Zhao, R Carter, W Vandervorst, ... Journal of Non-Crystalline Solids 303 (1), 123-133, 2002 | 123 | 2002 |
| Characterization of Cu surface cleaning by hydrogen plasma MR Baklanov, DG Shamiryan, Z Tökei, GP Beyer, T Conard, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001 | 113 | 2001 |
| A study of the influence of typical wet chemical treatments on the germanium wafer surface B Onsia, T Conard, S De Gendt, M Heyns, I Hoflijk, P Mertens, M Meuris, ... Solid State Phenom. 103, 19-22, 2005 | 105 | 2005 |
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| Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S B Groven, M Heyne, A Nalin Mehta, H Bender, T Nuytten, J Meersschaut, ... Chemistry of Materials 29 (7), 2927-2938, 2017 | 89 | 2017 |
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