Chemical manipulation of multifunctional hydrocarbons on silicon surfaces TR Leftwich, AV Teplyakov Surface science reports 63 (1), 1-71, 2008 | 220 | 2008 |
An NEXAFS investigation of the reduction and reoxidation of TiO2 (001) VS Lusvardi, MA Barteau, JG Chen, J Eng Jr, B Frühberger, A Teplyakov Surface Science 397 (1-3), 237-250, 1998 | 217 | 1998 |
Vibrational spectroscopic studies of Diels− Alder reactions with the Si (100)-2× 1 surface as a dienophile AV Teplyakov, MJ Kong, SF Bent Journal of the American Chemical Society 119 (45), 11100-11101, 1997 | 207 | 1997 |
NEXAFS studies of adsorption of benzene on Si (100)-2× 1 MJ Kong, AV Teplyakov, JG Lyubovitsky, SF Bent Surface science 411 (3), 286-293, 1998 | 129 | 1998 |
Diels–Alder reactions of butadienes with the Si (100)-2× 1 surface as a dienophile: Vibrational spectroscopy, thermal desorption and near edge x-ray absorption fine structure … AV Teplyakov, MJ Kong, SF Bent The Journal of chemical physics 108 (11), 4599-4606, 1998 | 118 | 1998 |
XPS characterization of cobalt impregnated SiO2 and γ‐Al2O3 J Cañón, AV Teplyakov Surface and Interface Analysis 53 (5), 475-481, 2021 | 108 | 2021 |
Reactivity of selectively terminated single crystal silicon surfaces KA Perrine, AV Teplyakov Chemical Society Reviews 39 (8), 3256-3274, 2010 | 86 | 2010 |
A NEXAFS investigation of the formation and decomposition of CuO and Cu2O thin films on Cu (100) AB Gurevich, BE Bent, AV Teplyakov, JG Chen Surface science 442 (1), L971-L976, 1999 | 83 | 1999 |
Scanning tunneling microscopy and X-ray photoelectron spectroscopy studies of graphene films prepared by sonication-assisted dispersion EY Polyakova, KT Rim, D Eom, K Douglass, RL Opila, TF Heinz, ... Acs Nano 5 (8), 6102-6108, 2011 | 76 | 2011 |
Calibration of computationally predicted N 1s binding energies by comparison with X-ray photoelectron spectroscopy measurements TR Leftwich, AV Teplyakov Journal of Electron Spectroscopy and Related Phenomena 175 (1-3), 31-40, 2009 | 75 | 2009 |
Semiconductor surface functionalization for advances in electronics, energy conversion, and dynamic systems AV Teplyakov, SF Bent Journal of Vacuum Science & Technology A 31 (5), 2013 | 73 | 2013 |
Temperature-Programmed Desorption Studies of n-Alkane Derivatives on Graphite: Desorption Energetics and the Influence of Functional Groups on Adsorbate … T Müller, GW Flynn, AT Mathauser, AV Teplyakov Langmuir 19 (7), 2812-2821, 2003 | 72 | 2003 |
Evidence for a Retro-Diels− Alder Reaction on a Single Crystalline Surface: Butadienes on Ge (100) AV Teplyakov, P Lal, YA Noah, SF Bent Journal of the American Chemical Society 120 (29), 7377-7378, 1998 | 67 | 1998 |
Universal calibration of computationally predicted N 1s binding energies for interpretation of XPS experimental measurements J Zhao, F Gao, SP Pujari, H Zuilhof, AV Teplyakov Langmuir 33 (41), 10792-10799, 2017 | 64 | 2017 |
The chemistry of inorganic precursors during the chemical deposition of films on solid surfaces ST Barry, AV Teplyakov, F Zaera Accounts of chemical research 51 (3), 800-809, 2018 | 63 | 2018 |
Interaction of C6 Cyclic Hydrocarbons with a Si(100)-2×1 Surface: Adsorption and Hydrogenation Reactions MJ Kong, AV Teplyakov, J Jagmohan, JG Lyubovitsky, C Mui, SF Bent The Journal of Physical Chemistry B 104 (14), 3000-3007, 2000 | 63 | 2000 |
Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity SF Bent, JS Kachian, JCF Rodríguez-Reyes, AV Teplyakov Proceedings of the National Academy of Sciences 108 (3), 956-960, 2011 | 62 | 2011 |
Adsorption of C60 Buckminster Fullerenes on an 11-Amino-1-undecene-Covered Si(111) Substrate X Zhang, AV Teplyakov Langmuir 24 (3), 810-820, 2008 | 59 | 2008 |
Effects of alkyl chain structure on carbon− halogen bond dissociation and β-hydride elimination by alkyl halides on a Cu (100) surface JL Lin, AV Teplyakov, BE Bent The Journal of Physical Chemistry 100 (25), 10721-10731, 1996 | 59 | 1996 |
–NH–Termination of the Si (111) Surface by Wet Chemistry F Tian, DF Taber, AV Teplyakov Journal of the American Chemical Society 133 (51), 20769-20777, 2011 | 58 | 2011 |